4H-SiC trench IGBT with lower on-state voltage drop

被引:6
|
作者
Liu, Yan-juan [1 ]
Wang, Ying [1 ]
Yu, Cheng-hao [2 ]
Fei-Cao [2 ]
机构
[1] Harbin Engn Univ, Coll Informat & Commun Engn, Harbin 150001, Peoples R China
[2] Hangzhou Dianzi Univ, Key Lab RF Circuits & Syst, Minist Educ, Hangzhou 310018, Zhejiang, Peoples R China
基金
美国国家科学基金会;
关键词
4H-SiC; Trench-gate IGBT; On-state voltage drop; Trade-off curve; GATE BIPOLAR-TRANSISTOR; DESIGN; BEHAVIOR; DMOS;
D O I
10.1016/j.spmi.2016.11.036
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this paper, a new 4H-SiC trench-gate IGBT structure incorporated a P+ shielding region in the emitter side is proposed in order to reduce the on-state voltage drop. Through the 2-D ATLAS simulation, the characteristics of the proposed structure are investigated and compared with the conventional structure. The simulation results indicate that the proposed structure exhibits an improvement in the following. Firstly, the on-state voltage drop is reduced by 32.75%. Secondly, the differential specific on-resistance is reduced by 42.33%. Finally, under the same on-state voltage drop, the turn-off energy is reduced more than 50.00%. At the end of the paper, it is explored that what effects the physical parameter of the P+ shielding region in the proposed structure have on the steady state performances. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码:56 / 63
页数:8
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