Empirical Pseudopotential and Full-Brillouin-Zone k • p Electronic Structure of CdTe, HgTe, and Hg1-xCdxTe

被引:16
|
作者
Penna, Michele [1 ]
Marnetto, Alberto [1 ]
Bertazzi, Francesco [1 ,2 ]
Bellotti, Enrico [2 ]
Goano, Michele [1 ]
机构
[1] Politecn Torino, Dipartimento Elettron, I-10129 Turin, Italy
[2] Boston Univ, ECE Dept, Boston, MA 02215 USA
关键词
CdTe; HgTe; HgCdTe; electronic structure; local density approximation; empirical pseudopotential method; k center dot p method; virtual crystal approximation; alloy scattering; dielectric function; high-frequency dielectric constant; MERCURY CADMIUM TELLURIDE; VALENCE-BAND DENSITIES; II-VI-COMPOUNDS; OPTICAL-PROPERTIES; ENERGY-GAP; TEMPERATURE-DEPENDENCE; CYCLOTRON-RESONANCE; FUNDAMENTAL REFLECTIVITY; ALLOY COMPOSITION; ZINCBLENDE;
D O I
10.1007/s11664-009-0798-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two alternative approximations of the electronic structure of CdTe and HgTe are proposed, both suited to the needs of accuracy and numerical efficiency of full-band carrier transport simulation: a local empirical pseudopotential (EPM) parametrization including relativistic corrections, and an original full-Brillouin-zone (FBZ) k center dot p model using two expansion points (Gamma and W). The EPM and k center dot p band structures closely match the available experimental and ab initio information, complemented with the results of new density functional theory (DFT)-local density approximation (LDA) calculations, for the conduction and valence bands relevant in transport phenomena. The EPM description of the binary compounds, featuring transferable Te pseudopotentials, is the basis for a computation of the electronic structure of the ternary alloy Hg1-xCdxTe in the framework of disorder-corrected virtual crystal approximation. The composition dependence of energy gaps, effective masses, and high-frequency dielectric constants are discussed and compared with available experimental data, and the novel FBZ approach is applied to the case of x = 0.7.
引用
收藏
页码:1717 / 1725
页数:9
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共 34 条
  • [1] Empirical Pseudopotential and Full-Brillouin-Zone k · p Electronic Structure of CdTe, HgTe, and Hg1−xCdxTe
    Michele Penna
    Alberto Marnetto
    Francesco Bertazzi
    Enrico Bellotti
    Michele Goano
    [J]. Journal of Electronic Materials, 2009, 38 : 1717 - 1725
  • [2] A SELECTIVE ETCHANT FOR HG1-XCDXTE CDTE AND HGTE ON GAAS
    LEECH, PW
    GWYNN, PJ
    KIBEL, MH
    [J]. APPLIED SURFACE SCIENCE, 1989, 37 (03) : 291 - 298
  • [3] INTERDIFFUSION PROFILES IN MOCVD CDTE/HGTE SUPERLATTICES AND HG1-XCDXTE MULTILAYERS
    ROSSOUW, CJ
    PAIN, GN
    GLANVILL, SR
    MCDONALD, DC
    [J]. JOURNAL OF CRYSTAL GROWTH, 1990, 106 (04) : 673 - 682
  • [4] CHARACTERIZATION OF CDTE, HGTE, AND HG1-XCDXTE GROWN BY CHEMICAL BEAM EPITAXY
    WAGNER, BK
    RAJAVEL, D
    BENZ, RG
    SUMMERS, CJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (03): : 1656 - 1660
  • [5] THERMAL-STABILITY AMONG HGTE/CDTE,HG1-XCDXTE/CDTE, AND HG1-XMNXTE/CDTE SUPERLATTICES
    STAUDENMANN, JL
    KNOX, RD
    FAURIE, JP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (05): : 3161 - 3165
  • [6] ELECTRONIC-STRUCTURE OF HG1-XCDXTE
    HASS, KC
    EHRENREICH, H
    VELICKY, B
    [J]. PHYSICAL REVIEW B, 1983, 27 (02): : 1088 - 1100
  • [7] MOLECULAR-BEAM EPITAXIAL-GROWTH OF CDTE, HGTE, AND HG1-XCDXTE ALLOYS
    SUMMERS, CJ
    MEEKS, EL
    COX, NW
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (02): : 224 - 228
  • [8] VPE OF THE HG1-XCDXTE OHMIC CONTACT LAYERS ON P-CDTE
    SOCHINSKII, NV
    BABENTSOV, VN
    KLETSKII, SV
    SERRANO, MD
    DIEGUEZ, E
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1993, 140 (02): : 445 - 451
  • [9] Structure study of Hg1-xCdxTe-HgTe superlattice and CdTe/ZnTe/GaAs heterojunctions
    Yu, FJ
    [J]. JOURNAL OF CRYSTAL GROWTH, 1999, 197 (04) : 1003 - 1007
  • [10] Structure of the CdTe/Cd0.959Zn0.041Te, Hg1-xCdxTe/CdTe, CdTe/GaAs heterojunctions
    Yu, FJ
    [J]. JOURNAL OF CRYSTAL GROWTH, 1999, 205 (03) : 264 - 269