Direct Laser Writing of Graphene Electronics

被引:120
|
作者
El-Kady, Maher F. [1 ,2 ,3 ]
Kaner, Richard B. [1 ,2 ,4 ]
机构
[1] Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
[2] Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USA
[3] Cairo Univ, Dept Chem, Fac Sci, Giza 12613, Egypt
[4] Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
关键词
SCALABLE FABRICATION; EPITAXIAL GRAPHENE; HIGH-PERFORMANCE; OXIDE; PHOTOCATALYSTS;
D O I
10.1021/nn504946k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
One of the fundamental issues with graphene for logic applications is its lack of a band gap. In this issue of ACS Nano, Shim and colleagues introduce an effective approach for modulating the current flow in graphene by forming p-n junctions using lasers. The findings could lead to a new route for controlling the electronic properties of graphene-based devices. We highlight recent progress in the direct laser synthesis and patterning of graphene for numerous applications. We also discuss the challenges and opportunities in translating this remarkable progress toward the direct laser writing of graphene electronics at large scales.
引用
收藏
页码:8725 / 8729
页数:5
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