Study of lateral growth regions in ammonothermal c-plane GaN

被引:4
|
作者
Xu, Lei [1 ,2 ]
Li, Tengkun [2 ]
Ren, Guoqiang [2 ,3 ]
Su, Xujun [2 ]
Gao, Xiaodong [2 ]
Zheng, Shunan [2 ]
Wang, Haixiao [1 ,2 ]
Xu, Ke [2 ,3 ]
机构
[1] Univ Sci & Technol China, Sch Nano Sci & Technol Inst, Hefei 230026, Anhui, Peoples R China
[2] Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Suzhou 215123, Jiangsu, Peoples R China
[3] Suzhou Nanowin Sci & Technol Co Ltd, Suzhou 215123, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
Characterization; Ammonothermal crystal growth; Gallium compounds; Semiconducting III-V materials; CRYSTALS; VACANCIES; HYDROGEN; DEFECTS;
D O I
10.1016/j.jcrysgro.2020.125987
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Lateral growth in the a-direction is an effective way to expand the size of crystal in basic ammonothermal GaN growth. Cathodoluminescence image of cross section clearly revealed several different regions along a-direction. Stress distributions and optical properties were investigated among these different regions by Raman spectroscopy and photoluminescence spectroscopy, respectively. TOF-SIMS mapping showed the spatial distribution of O, H, Si and C impurities in lateral growth regions. Our results indicate that there is small stress variation among the interfaces. Different concentration of impurities incorporated in these regions, especially O impurity, which can significantly increase the free carrier concentration. Fairly low concentration and uniform distribution of C impurity indicated that YL band in PL spectra is not closely related to carbon impurity or a complex involving carbon. Based on the above data, the evolution process of lateral crystal growth is deduced.
引用
收藏
页数:7
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