In Reference to Trends, Etiologies, and Predictors of 90-Day Readmission After Percutaneous Ventricular Assist Device Implantation: A National Population-Based Cohort Study

被引:0
|
作者
Glazier, James J. [1 ]
Kaki, Amir [1 ]
机构
[1] Wayne State Univ, Dept Cardiol, Detroit Med Ctr, Heart Hosp, Detroit, MI 48202 USA
关键词
SUPPORT;
D O I
10.1002/clc.22989
中图分类号
R5 [内科学];
学科分类号
1002 ; 100201 ;
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页码:886 / 887
页数:2
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