Kinetically controlled, adhesiveless transfer printing using microstructured stamps

被引:86
|
作者
Kim, Tae-Ho [1 ,2 ]
Carlson, Andrew [1 ,2 ]
Ahn, Jong-Hyun [3 ]
Won, Sang Min [4 ]
Wang, Shuodao [5 ]
Huang, Yonggang [5 ,6 ]
Rogers, John A. [1 ,2 ,4 ,7 ]
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Beckman Inst, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Sungkyunkwan Univ, SKKU Adv Inst Nanotechnol, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
[4] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[5] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA
[6] Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA
[7] Univ Illinois, Dept Chem, Urbana, IL 61801 USA
关键词
adhesion; embossing; micromechanical devices; nanostructured materials; printing; silicon-on-insulator; surface topography; transistors; ADHESION;
D O I
10.1063/1.3099052
中图分类号
O59 [应用物理学];
学科分类号
摘要
This letter describes the physics and application of an approach to transfer printing that uses stamps with microstructures of relief embossed into their surfaces. Experimental measurement of velocity-dependent adhesive strength as a function of relief geometry reveals key scaling properties and provides a means for comparison to theoretical expectation. Formation of transistor devices that use nanoribbons of silicon transfer printed directly onto glass substrates without adhesive layers demonstrates the use of this type of approach for a high-performance (mobilities >325 cm(2)/V s and on/off ratios >10(5)) single crystal silicon on glass technology.
引用
收藏
页数:3
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