Investigation of thermal stability of Cu/W multilayers by in-situ x-ray diffraction

被引：0
|
作者：
Cancellieri, Claudia [1 ]
Moszner, Frank [1 ]
Chiodi, Mirco [1 ]
Yoon, Songhak [1 ]
Ariosa, Daniel [2 ]
Janczak-Rusch, Jolanta [1 ]
Jeurgens, Lars [1 ]
机构：
[1] Empa Swiss Fed Labs Mat Sci & Technol, Uberlandstr 129, CH-8600 Dubendorf, Switzerland
[2] Univ Republica, Inst Fis, Fac Ingn, Herrera & Reissig 565,CC 30, Montevideo 11000, Uruguay
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 2016年 / 72卷
关键词：
X-ray diffraction; Microstructure; Morphological stability;
D O I：
10.1107/S205327331609389X
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
MS43-P2
引用
收藏
页码：S418 / S418
页数：1
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