FABRICATION AND CHARACTERIZATION OF FUNCTIONALLY GRADED Ni-Ti MULTILAYER THIN FILMS

被引：15
|
作者：
Tian, H. [1 ]
Schryvers, D. [1 ]
Mohanchandra, K. P. [2 ]
Carman, G. P. [2 ]
Van Humbeeck, J. [3 ]
机构：
[1] Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
[2] Univ Calif Los Angeles, Mech & Aerosp Dept, Los Angeles, CA 90095 USA
[3] Katholieke Univ Leuven, Dept Met & Mat Engn MTM, B-3001 Leuven, Belgium
来源：
FUNCTIONAL MATERIALS LETTERS | 2009年 / 2卷 / 02期
关键词：
Functionally graded Ni-Ti; shape memory alloys; heated target; EELSMODEL; thin film; multilayer; TEM; SHAPE-MEMORY ALLOY; SPUTTER-DEPOSITION; TARGET;
D O I：
10.1142/S1793604709000570
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A functionally graded multilayer Ni-Ti thin film was deposited on a SiO2/Si substrate by d.c.sputtering using a ramped heated Ni-Ti alloy target. The stand-alone films were crystallized at 500 degrees C in vacuum better than 10(-7) Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni.
引用
收藏
页码：61 / 66
页数：6
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