Applicability of fracture mechanics on brittle delamination of nanoscale film edge

被引:11
|
作者
Kitamura, T [1 ]
Hirakata, H
Satake, Y
机构
[1] Kyoto Univ, Dept Engn Phys & Mech, Sakyo Ku, Kyoto 6068501, Japan
[2] Kyoto Univ, Grad Sch Informat, Kyoto 6068501, Japan
关键词
delamination; molecular dynamics; fracture mechanics; stress concentration; thin film; interface edge; crack; initiation; nanomechanics;
D O I
10.1299/jsmea.47.106
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
The stress concentration near the interface edge of a film/substrate, which dominates the delamination, is analyzed by molecular dynamics (MD) analysis. Here, the film thickness is on the nanoscale and the interatomic interaction is simulated by Morse-type model potentials. Three types of load are applied to the film/substrate to examine the effect of the stress-concentrated region on the delamination at the interface edge. At lower applied load, the stress distribution along the interface near the edge in the MD simulation coincides well with that obtained by linear elastic analysis (FEM: Finite Element Method). However, after the stress near the edge reaches the ideal strength of the interface, it deviates from the FEM result. The delamination crack is initiated from the free edge when the stress at y < 1 nm (y: distance from the edge) reaches the ideal interface strength. This signifies the criterion of interface toughness that the delamination is governed by the stress in the region (process zone). This also suggests the limit of applicability of linear elastic fracture mechanics on the nanoscale components.
引用
收藏
页码:106 / 112
页数:7
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