Continuum stress intensity factors from atomistic fracture simulations

被引:23
|
作者
Wilson, Mark A. [1 ]
Grutzik, Scott J. [2 ]
Chandross, Michael [1 ]
机构
[1] Sandia Natl Labs, Computat Mat & Data Sci, POB 5800, Albuquerque, NM 87185 USA
[2] Sandia Natl Labs, Component Sci & Mech, POB 5800, Albuquerque, NM 87185 USA
关键词
Stress intensity factors; Molecular dynamics; Silica glass; ReaxFF; Fracture toughness; MOLECULAR-DYNAMICS SIMULATIONS; TIP ASYMPTOTIC FIELD; CRACK-PROPAGATION; VITREOUS SILICA; COEFFICIENTS; REAXFF; POTENTIALS; STRENGTH; BEHAVIOR; GLASSES;
D O I
10.1016/j.cma.2019.05.050
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Stress intensity factors (SIFs) are used in continuum fracture mechanics to quantify the stress fields surrounding a crack in a homogeneous material in the linear elastic regime. Critical values of the SIFs define an intrinsic measure of the resistance of a material to propagate a crack. At atomic scales, however, fracture occurs as a series of atomic bonds breaking, differing from the continuum description. As a consequence, a formal analog of the continuum SIFs calculated from atomistic simulations can have spatially localized, microstructural contributions that originate from varying bond configurations. The ability to characterize fracture at the atomic scale in terms of the SIFs offers both an opportunity to probe the effects of chemistry, as well as how the addition of a microstructural component affects the accuracy. We present a novel numerical method to determine SIFs from molecular dynamics (MD) simulations. The accuracy of this approach is first examined for a simple model, and then applied to atomistic simulations of fracture in amorphous silica. MD simulations provide time and spatially dependent SIFs, with results that are shown to be in good agreement with experimental values for fracture toughness in silica glass. (C) 2019 Published by Elsevier B.V.
引用
收藏
页码:732 / 749
页数:18
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