Enhanced Electrical Transport and Thermoelectric Properties in Ni Doped Cu3SbSe4

被引:4
|
作者
Kumar, Aparabal [1 ]
Dhama, P. [1 ]
Das, Anish [1 ]
Sarkar, Kalyan Jyoti [2 ]
Banerji, P. [1 ]
机构
[1] Indian Inst Technol Kharagpur, Mat Sci Ctr, Kharagpur 721302, W Bengal, India
[2] Indian Inst Technol Kharagpur, Adv Technol Dev Ctr, Kharagpur 721302, W Bengal, India
关键词
D O I
10.1063/1.5032685
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, we report the enhanced thermoelectric performance of Cu3SbSe4 by Ni doping at Cu site. Cu3-xNixSbSe4 (x = 0, 0.01, 0.03, 0.05) were prepared by melt growth, ball milling followed by spark plasma sintering. Structural characterization, phase analysis and surface morphology were carried out using X-ray diffraction, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. Electrical and thermal properties of all the samples were investigated in the temperature range 300 - 650 K. Decrease in electrical resistivity with Ni doping due to increase in carrier concentration with enhanced Seebeck coefficient via increase in density of state near the Fermi level gives a remarkably high power factor. At the same time, thermal conductivity was found to decrease due to increased carrier-phonon scattering and acoustic phonon scattering. Consequently, a remarkable enhancement in the thermoelectric figure of merit (ZT similar to 0.65) of Cu3-xNixSbSe4 was achieved for x = 0.01 sample. Thus, Ni doping is an effective approach to improve the efficiency of Cu3SbSe4.
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页数:4
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