Diffusion-limited deposition of dipolar particles

被引:0
|
作者
de los Santos, F [1 ]
Tavares, JM
Tasinkevych, M
da Gama, MMT
机构
[1] Univ Granada, Dept Electromagnetismo & Fis Mat, E-18071 Granada, Spain
[2] Univ Lisbon, Ctr Fis Teor & Computac, P-1649003 Lisbon, Portugal
[3] Inst Super Engn Lisboa, P-1949014 Lisbon, Portugal
[4] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
[5] Univ Lisbon, Fac Ciencias, Dept Fis, Lisbon, Portugal
来源
PHYSICAL REVIEW E | 2004年 / 69卷 / 06期
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D O I
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中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Deposits of dipolar particles are investigated by means of extensive Monte Carlo simulations. We found that the effect of the interactions is described by an initial, nonuniversal, scaling regime characterized by orientationally ordered deposits. In the dipolar regime, the order and geometry of the clusters depend on the strength of the interactions and the magnetic properties are tunable by controlling the growth conditions. At later stages, the growth is dominated by thermal effects and the diffusion-limited universal regime obtains, at finite temperatures. At low temperatures the crossover size increases exponentially as T decreases and at T=0 only the dipolar regime is observed.
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页数:5
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