Threshold Fluence Measurement for Laser Liftoff of InP Thin Films by Selective Absorption

被引:2
|
作者
Jan, Antony [1 ]
Reeves, Benjamin A. [1 ]
de Burgt, Yoeri van [1 ]
Hayes, Garrett J. [1 ]
Clemens, Bruce M. [1 ]
机构
[1] Stanford Univ, Geballe Lab Adv Mat, Dept Mat Sci, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
III-V; InP; laser liftoff; semiconductor; thin film; COMPOUND SEMICONDUCTORS; SOLAR-CELL; GAAS; TECHNOLOGY; DEPENDENCE;
D O I
10.1002/adem.201700624
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We explore conditions for achieving laser liftoff in epitaxially grown heterojunctions, in which single crystal thin films can be separated from their growth substrates using a selectively absorbing buried intermediate layer. Because this highly non-linear process is subject to a variety of process instabilities, it is essential to accurately characterize the parameters resulting in liftoff. Here, we present an InP/InGaAs/InP heterojunction as a model system for such characterization. We show separation of InP thin films from single crystal InP growth substrates, wherein a approximate to 10 ns, Nd: YAG laser pulse selectively heats a coherently strained, buried InGaAs layer. We develop a technique to measure liftoff threshold fluences within an inhomogeneous laser spatial profile, and apply this technique to determine threshold fluences of the order 0.5 J cm(-2) for our specimens. We find that the fluence at the InGaAs layer is limited by non-linear absorption and InP surface damage at high powers, and measure the energy transmission in an InP substrate from 0 to 8 J cm(-2). Characterization of the ejected thin films shows crack-free, single crystal InP. Finally, we present evidence that the hot InGaAs initiates a liquid phase front that travels into the InP substrate during liftoff.
引用
收藏
页数:7
相关论文
共 50 条
  • [1] Laser liftoff of gallium arsenide thin films
    Garrett J. Hayes
    Bruce M. Clemens
    MRS Communications, 2015, 5 : 1 - 5
  • [2] Laser liftoff of gallium arsenide thin films
    Hayes, Garrett J.
    Clemens, Bruce M.
    MRS COMMUNICATIONS, 2015, 5 (01) : 1 - 5
  • [3] LASER CALORIMETER FOR UV ABSORPTION MEASUREMENT OF DIELECTRIC THIN-FILMS
    SAHOO, NK
    APPARAO, KVSR
    APPLIED OPTICS, 1992, 31 (28): : 6111 - 6116
  • [4] Prediction of damage threshold fluence for metal films by an ultrashort laser pulse
    Jiang, L
    George, N
    Tsai, HL
    FIFTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2004, 5662 : 667 - 672
  • [5] Investigation of laser induced damage threshold measurement with single-shot on thin films
    Liu, Zhichao
    Zheng, Yi
    Pan, Feng
    Lin, Qi
    Ma, Ping
    Wang, Jian
    APPLIED SURFACE SCIENCE, 2016, 382 : 294 - 301
  • [6] THRESHOLD MEASUREMENTS OF LASER DAMAGE IN THIN FILMS
    BECKER, J
    COOMBS, WF
    TURNER, AF
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1966, 56 (10) : 1435 - &
  • [7] Laser deposition of AlN thin films on InP and GaAs
    Bhattacharya, Pijush
    Bose, Dwarka N.
    Japanese Journal of Applied Physics, Part 2: Letters, 1991, 30 (10 A):
  • [8] Absorption, Gain, and Threshold in InP/AlGaInP Quantum Dot Laser Diodes
    Al-Ghamdi, Mohammed S.
    Smowton, Peter M.
    Shutts, Samuel
    Blood, Peter
    Beanland, Richard
    Krysa, Andrey B.
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 2013, 49 (04) : 389 - 394
  • [9] Effect of laser fluence on the deposition and hardnessof boron carbide thin films
    F. Kokai
    M. Taniwaki
    M. Ishihara
    Y. Koga
    Applied Physics A, 2002, 74 : 533 - 536
  • [10] Effect of laser fluence on the deposition and hardness of boron carbide thin films
    Kokai, F
    Taniwaki, M
    Ishihara, M
    Koga, Y
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2002, 74 (04): : 533 - 536