Fabrication and characterization of individually ballasted carbon nanotube field emitter arrays using doped silicon resistor

被引:0
|
作者
Li, Yunhan [1 ]
Sun, Yonghai [1 ]
Yeow, John T. W. [1 ]
机构
[1] Univ Waterloo, Dept Syst Design Engn, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
关键词
X-RAY; EMISSION; CATHODE; DESIGN;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, individually ballasted carbon nanotube (CNT) field emitter arrays (FEAs) using a doped silicon ballast resistor are designed and fabricated. Each CNT field emitter is in series with an n-type doped silicon resistor with 10 mu m in length, a doping concentration of 10(14) cm(-1) and a cross section area of 1 mu m(2) to limit FE current from a single emitter no more than 1.2 mu A. A systematic study and discussion are described by fabricating and characterizing A CNT FEA with 8260 CNT emitters in a 1 mm(2) octagonal area with an inter-emitter distance of 10 mu m and a 10x10 CNT FEA. Benefitting from the saturation of drift velocity in doped silicon, the FE current can be successfully limited at a high current level without sacrificing the sensitivity and efficiency of electron extracting. The proposed approach is able to improve our CNT cathode reliability and stability for practical applications.
引用
收藏
页码:495 / 498
页数:4
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