Phonon-assisted carrier transport through a lattice-mismatched interface

被引:10
|
作者
Yoon, Hyong Seo [1 ]
Oh, Juyeong [1 ]
Park, Jae Young [1 ]
Kang, JeongSeob [1 ]
Kwon, Junyoung [2 ]
Cusati, Teresa [3 ]
Fiori, Gianluca [3 ]
Iannaccone, Giuseppe [3 ]
Fortunelli, Alessandro [4 ]
Ozcelik, V. Ongun [5 ]
Lee, Gwan-Hyoung [2 ,6 ]
Low, Tony [7 ]
Jun, Seong Chan [1 ]
机构
[1] Yonsei Univ, Sch Mech Engn, Seoul 03722, South Korea
[2] Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
[3] Univ Pisa, Dipartimento Ingn Informaz, Via G Caruso 16, I-56122 Pisa, Italy
[4] CNR, ICCOM, I-56124 Pisa, Italy
[5] Princeton Univ, Andlinger Ctr Energy & Environm, Princeton, NJ 08544 USA
[6] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
[7] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
基金
新加坡国家研究基金会;
关键词
DIRECT GROWTH; WORK FUNCTION; MOS2; HETEROSTRUCTURES; TRANSITION; GRAPHENE; CONTACT;
D O I
10.1038/s41427-019-0113-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
MoS2 typically exhibits unconventional layer-thickness-dependent electronic properties. It also exhibits layer-dependent band structures including indirect-to-direct band transitions, owing to which the electronic and carrier transport properties of a lattice-mismatched, conducting, two-dimensional junction are distinct with the naturally stepwise junction behaving as a 1D junction. We found distinguishable effects at the interface of vertically stacked MoS2. The results revealed that misorientationally stacked layers exhibited significantly low junction resistance and independent energy bandgaps without bending owing to their effectively decoupled behavior. Further, phonon-assisted carriers dominantly affected the lattice-mismatched interface owing to its low junction resistance, as determined via low-temperature measurement. Our results could facilitate the realization of high-performance MoS2 transistors with small contact resistances caused by lattice mismatching.
引用
收藏
页数:10
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