2D modeling and simulation of the flow dynamics, electric field and reactions in a low-temperature, atmospheric-pressure nitrogen plasma sharp-end plate-to-plane configuration and CVD reactor
被引:3
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作者:
De Wilde, Juray
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机构:
Catholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, BelgiumCatholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, Belgium
De Wilde, Juray
[1
]
Lorant, Christophe
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机构:
Catholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, BelgiumCatholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, Belgium
Lorant, Christophe
[1
]
Descamps, Pierre
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机构:
Dow Corning, Solar Cell S&T Res, Seneffe, BelgiumCatholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, Belgium
Descamps, Pierre
[2
]
机构:
[1] Catholic Univ Louvain, Mat & Proc Engn IMAP, Pl St Barbe 2, B-1348 Louvain, Belgium
[2] Dow Corning, Solar Cell S&T Res, Seneffe, Belgium
atmospheric-pressure plasma;
flow dynamics;
plasma simulation;
(plasma enhanced) chemical vapor deposition;
modelling in line reactor prototype;
APPECVD;
DIELECTRIC BARRIER DISCHARGE;
CHEMICAL-VAPOR-DEPOSITION;
GAS-DISCHARGE;
FLUID MODELS;
THIN-FILMS;
JET;
CONVERSION;
PARTICLES;
MIXTURES;
KINETICS;
D O I:
10.1088/1361-6463/aa5c1d
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In atmospheric-pressure plasma reactors, the flow dynamics can be complex, determine the reactor performance and complicate scale-up. Coupling computational fluid dynamics to the calculation of the electric field and plasma chemistry is challenging because of the numerical stiffness introduced by the difference in time scale of the different phenomena involved. Focusing on low-temperature, atmospheric-pressure pure nitrogen plasma, a model and model reduction based solution strategy to deal with the numerical stiffness are presented and evaluated. The influence of the electric field on the flow dynamics and species concentration fields is first qualitatively studied by means of 2D simulations of a sharp-end plate-to-plane configuration. Next, a specific reactor prototype for low-temperature, atmospheric-pressure plasma-enhanced chemical vapor deposition for in-line surface treatments is simulated to illustrate the importance of accounting for the detailed flow dynamics.