Photodetachment Microscopy of hydrogen negative ion in a Uniform Magnetic Field

The photodetachment microscopy of hydrogen negative ion in a uniform magnetic field is investigated on the basis of the semiclassical theory. Unlike the case of the photodetachment of hydrogen negative ion (H-) in a uniform electric field, where only two trajectories of the detached electron arrived at a given detector and the photodetachment microscopy interference pattern is regular. For the photodetachment of H- in a uniform magnetic field, due to the influence of the magnetic field force, more than two trajectories of the detached electron emitting from different directions may intersect at a given detector, thus creating a complex interference pattern in the electron flux distributions. Our calculation suggests that the electron flux distributions is not only related to the magnetic field strength, but also related to the electron energy and the position of the detector. Therefore, the interference pattern in the detached-electron flux distributions can be controlled by adjusting the magnetic field strength and the detached electron's energy. We hope that our studies may guide the future experimental researches in the photodetachment microscopy of negative ion in the magnetic field.