Heavy doping effects in Mg-doped GaN

被引:339
|
作者
Kozodoy, P [1 ]
Xing, HL
DenBaars, SP
Mishra, UK
Saxler, A
Perrin, R
Elhamri, S
Mitchel, WC
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2] USAF, Res Lab, Mat & Mfg Directorate, MLPO, Wright Patterson AFB, OH 45433 USA
[3] Univ Dayton, Dept Phys, Dayton, OH 45469 USA
关键词
D O I
10.1063/1.372098
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrical properties of p-type Mg-doped GaN are investigated through variable-temperature Hall effect measurements. Samples with a range of Mg-doping concentrations were prepared by metalorganic chemical vapor phase deposition. A number of phenomena are observed as the dopant density is increased to the high values typically used in device applications: the effective acceptor energy depth decreases from 190 to 112 meV, impurity conduction at low temperature becomes more prominent, the compensation ratio increases, and the valence band mobility drops sharply. The measured doping efficiency drops in samples with Mg concentration above 2 x 10(20) cm(-3). (C) 2000 American Institute of Physics. [S0021-8979(00)04304-8].
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收藏
页码:1832 / 1835
页数:4
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