Perspective on the switching behavior of HfO2-based ferroelectrics

被引:19
|
作者
Wang, Chenxi [1 ,2 ]
Qiao, Huimin [1 ,2 ]
Kim, Yunseok [1 ,2 ]
机构
[1] Sungkyunkwan Univ SKKU, Sch Adv Mat Sci & Engn, Suwon 16419, South Korea
[2] Sungkyunkwan Univ SKKU, Res Ctr Adv Mat Technol, Suwon 16419, South Korea
基金
新加坡国家研究基金会;
关键词
FIELD-CYCLING BEHAVIOR; THIN-FILMS; WAKE-UP; NEGATIVE CAPACITANCE; ELECTRIC-FIELD; POLARIZATION; DYNAMICS; ENDURANCE; MECHANISMS; SIMULATION;
D O I
10.1063/5.0035652
中图分类号
O59 [应用物理学];
学科分类号
摘要
Since ferroelectricity was first observed in 2011, HfO2-based ferroelectrics have garnered significant attention, owing to their compatibility with complementary metal-oxide-semiconductors. Moreover, their thickness scalability facilitates the miniaturization of integrated circuit systems. The ultrafast polarization switching speed in the range of sub-nanoseconds helps in the fabrication of fast-operation devices. The origins of ferroelectricity in HfO2-based ferroelectrics differ from those of conventional perovskite ferroelectrics, with more complex behaviors associated with polarization switching. In this Perspective, recent investigations on the complex behaviors pertaining to polarization switching, including wake-up, split-up, fatigue, negative capacitance, accumulative switching, and some of their relations are discussed. Furthermore, the polarization switching dynamics have also been studied. Finally, the potential applications and investigations of HfO2-based ferroelectrics are discussed.
引用
收藏
页数:13
相关论文
共 50 条
  • [1] HfO2-Based Ferroelectrics Applications in Nanoelectronics
    Dragoman, Mircea
    Aldrigo, Martino
    Dragoman, Daniela
    Iordanescu, Sergiu
    Dinescu, Adrian
    Modreanu, Mircea
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2021, 15 (05):
  • [2] Thickness-Independent Behavior of Coercive Field in HfO2-based Ferroelectrics
    Migita, Shinji
    Ota, Hiroyuki
    Yamada, Hiroyuki
    Sawa, Akihito
    Toriumi, Akira
    2017 IEEE ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM), 2017, : 255 - 256
  • [3] A grease for domain walls motion in HfO2-based ferroelectrics
    Kashir, Alireza
    Farahani, Mehrdad Ghiasabadi
    Lancok, Jan
    Hwang, Hyunsang
    Kamba, Stanislav
    NANOTECHNOLOGY, 2022, 33 (15)
  • [4] Tunable Microwave Filters Using HfO2-Based Ferroelectrics
    Aldrigo, Martino
    Dragoman, Mircea
    Iordanescu, Sergiu
    Nastase, Florin
    Vulpe, Silviu
    NANOMATERIALS, 2020, 10 (10) : 1 - 12
  • [5] Investigation of the Resistive Switching Behavior in Ni/HfO2-based RRAM Devices
    Gonzalez, M. B.
    Acero, M. C.
    Beldarrain, O.
    Zabala, M.
    Campabadal, F.
    PROCEEDINGS OF THE 2015 10TH SPANISH CONFERENCE ON ELECTRON DEVICES (CDE), 2015, : 14 - +
  • [6] Resistance switching in HfO2-based OxRRAM devices
    Calka, P.
    Martinez, E.
    Lafond, D.
    Dansas, H.
    Tirano, S.
    Jousseaume, V.
    Bertin, F.
    Guedj, C.
    MICROELECTRONIC ENGINEERING, 2011, 88 (07) : 1140 - 1142
  • [7] A HfO2-Based Complementary Switching Crossbar Adder
    Breuer, Thomas
    Siemon, Anne
    Linn, Eike
    Menzel, Stephan
    Waser, Rainer
    Rana, Vikas
    ADVANCED ELECTRONIC MATERIALS, 2015, 1 (10):
  • [8] Pushing Sputtered HfO2-Based Ferroelectrics toward BEOL Compatibility
    Wang, Xuetao
    Mikolajick, Thomas
    Grube, Matthias
    2022 IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE, NMDC, 2022, : 21 - 24
  • [9] Impact of Temperature on the Resistive Switching Behavior of Embedded HfO2-Based RRAM Devices
    Walczyk, Christian
    Walczyk, Damian
    Schroeder, Thomas
    Bertaud, Thomas
    Sowinska, Malgorzata
    Lukosius, Mindaugas
    Fraschke, Mirko
    Wolansky, Dirk
    Tillack, Bernd
    Miranda, Enrique
    Wenger, Christian
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (09) : 3124 - 3131
  • [10] Switching Behavior of HfO2-based Resistive RAM with Vertical CNT Bottom Electrode
    Avasarala, Naga Sruti
    Heyns, Marc
    Van Houdt, Jan
    van der Veen, Marleen H.
    Wouters, Dirk J.
    Jurczak, Malgorzata
    2017 IEEE 9TH INTERNATIONAL MEMORY WORKSHOP (IMW), 2017, : 72 - 75