Atomic Layer Deposited Ti2O3 Thin Films

被引：1

作者：

Manjunath, K. ^{[1
]}

Saraswat, A. ^{[1
]}

Samrat, D. ^{[1
]}

Rao, C. N. R. ^{[1
]}

机构：

[1] Jawaharlal Nehru Ctr Adv Sci Res, Int Ctr Mat Sci, Sch Adv Mat, New Chem Unit, Jakkur PO, Bengaluru 560064, India

来源：

CHEMPHYSCHEM | 2022年 / 23卷 / 10期

关键词：

Ti2O3; insulator-metal transition; atomic layer deposition; corundum structure; thin films; CRYSTAL-STRUCTURE; TITANIUM-OXIDES; RUTILE TIO2; TRANSITION; SEMICONDUCTOR; ANATASE; V2O3;

D O I：

10.1002/cphc.202100910

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ti2O3 thin films have been prepared through atomic layer deposition and subjected to electrical resistivity measurements as a function of temperature. The as-prepared films were stable for up to three weeks. In Ti2O3 thin films, the insulator-metal transition is observed at similar to 80 K, with nearly 3-4 orders of magnitude change in resistivity. The anomalous increase in electrical resistivity in the films is in accordance with the two-band model. However, the energy interval between the bands depending on the crystallographic c/a ratio leads to a change in electrical resistivity as a function of temperature.

引用

页数：6

共 50 条

[1] Observation of superconductivity in structure-selected Ti2O3 thin films
Li, Yangyang
Weng, Yakui
Zhang, Junjie
Ding, Junfeng
Zhu, Yihan
Wang, Qingxiao
Yang, Yang
Cheng, Yingchun
Zhang, Qiang
Li, Peng
Lin, Jiadan
Chen, Wei
Han, Yu
Zhang, Xixiang
Chen, Lang
Chen, Xi
Chen, Jingsheng
Dong, Shuai
Chen, Xianhui
Wu, Tom
[J]. NPG ASIA MATERIALS, 2018, 10 : 522 - 532
[2] Observation of superconductivity in structure-selected Ti2O3 thin films
Yangyang Li
Yakui Weng
Junjie Zhang
Junfeng Ding
Yihan Zhu
Qingxiao Wang
Yang Yang
Yingchun Cheng
Qiang Zhang
Peng Li
Jiadan Lin
Wei Chen
Yu Han
Xixiang Zhang
Lang Chen
Xi Chen
Jingsheng Chen
Shuai Dong
Xianhui Chen
Tom Wu
[J]. NPG Asia Materials, 2018, 10 : 522 - 532
[3] Synthesis and Atomic Characterization of a Ti2O3 Nanosheet
Ohwada, Megumi
Kimoto, Koji
Suenaga, Kazutomo
Sato, Yuta
Ebina, Yasuo
Sasaki, Takayoshi
[J]. JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2011, 2 (14): : 1820 - 1823
[4] Influence of annealing on atomic layer deposited Cr2O3-TiO2 thin films
Parna, Rainer
Tarre, Aivar
Gerst, Alar
Mandar, Hugo
Niilisk, Ahti
Uustare, Teet
Rosental, Arnold
Sammelselg, Vaino
[J]. ADVANCED OPTICAL MATERIALS, TECHNOLOGIES, AND DEVICES, 2007, 6596
[5] As2S3 thin films deposited by atomic layer deposition
Farm, Elina
Heikkila, Mikko J.
Vehkamaki, Marko
Mizohata, Kenichiro
Ritala, Mikko
Leskela, Markku
Kemell, Marianna
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (01):
[6] Superconductivity in Ti2O3 films on MgO substrate
Gantepogu, Chandra Shekar
Ganesan, Peramaiyan
Paul, Tanmoy
Huang, Chun-Hao
Chi, Po-Wei
Wu, Maw-Kuen
[J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2022, 35 (06):
[7] Large anisotropy in conductivity of Ti2O3 films
Yoshimatsu, K.
Kurokawa, H.
Horiba, K.
Kumigashira, H.
Ohtomo, A.
[J]. APL MATERIALS, 2018, 6 (10):
[8] Optimization of Ti2O3 thin films by magnetron sputtering and study of their photoelectric performance
Wang, Wenwei
He, Jialiang
Yao, Yingbang
[J]. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY, 2024,
[9] Chemical and structural properties of atomic layer deposited La2O3 films capped with a thin Al2O3 layer
Li, X. L.
Tsoutsou, D.
Scarel, G.
Wiemer, C.
Capelli, S. C.
Volkos, S. N.
Lamagna, L.
Fanciulli, M.
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (02): : L1 - L7
[10] A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Nistor, L
Richard, O
Zhao, C
Bender, H
Stesmans, A
Van Tendeloo, G
[J]. MICROSCOPY OF SEMICONDUCTING MATERIALS 2003, 2003, (180): : 397 - 400

← 1 2 3 4 5 →