Ablation area quasiperiodic oscillations in semiconductors with femtosecond laser double-pulse delay

被引:8
|
作者
Li, Xin [1 ]
Li, Cong [1 ]
Jiang, Lan [1 ]
Shi, Xuesong [1 ]
Zhang, Ning [1 ]
Lu, Yongfeng [2 ]
机构
[1] Beijing Inst Technol, Sch Mech Engn, Natl Sci Fdn China, NanoMfg Fundamental Res Joint Lab, Beijing 100081, Peoples R China
[2] Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
基金
中国国家自然科学基金;
关键词
IRRADIATION; EXCITATION; SILICON;
D O I
10.1364/OL.39.002382
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A surprising repeatable phenomenon regarding semiconductor ablation area changes has been discovered. Irradiated by femtosecond double pulses, the ablation area quasiperiodically oscillates as the pulse delay increases from 0 to 1 ps at a material-dependent fluence range. In contrast, the ablation area monotonically decreases as the pulse delay increases beyond 1 ps or if the total fluence increases close to or beyond the single-shot threshold. Similar unexpected patterns of area quasiperiodic oscillations with the double-pulse delay are observed in various semiconductors, including Ge, Si, GaAs, and ZnO. The comparison study shows the same phenomenon in Au-plated ZnO. Yet, its oscillation periods are shorter and more stable than those in bulk ZnO, which implies that the localized carrier density is the key factor in oscillation periods. (C) 2014 Optical Society of America
引用
收藏
页码:2382 / 2385
页数:4
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