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- [5] Preparation of stable F-doped SiO2 thin films from Si(NCO)(4)/SiF4/02 gas mixtures using a conventional capacitively coupled RF plasma source JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7B): : 4911 - 4916
- [6] Preparation of stable F-doped SiO[vv 2] thin films from Si(NCO)[vv 4]/SiF[vv 4]/O[vv 2] gas mixtures using a conventional capacitively coupled RF plasma source Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (7B): : 4911 - 4916