MULTIBEAM ELECTRON GUN WITH ARC-PLASMA DEPOSING DISPENSER (IMPREGNATED) CATHODE

被引：0
|
作者：
Akimov, P. J. [1 ]
Boikova, T. S. [1 ]
Nikitin, A. P. [1 ]
Smirnov, V. A. [1 ]
机构：
[1] Fsue R&P Corp Toriy, Moscow, Russia
来源：
APEDE 2008: INTERNATIONAL CONFERENCE ON ACTUAL PROBLEMS OF ELECTRON DEVICES ENGINEERING | 2008年
关键词：
D O I：
10.1109/APEDE.2008.4720136
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper deals with 19-beam electron gun was calculated and projected with using single dispenser (impregnated) cathode with porous matrix which are build with the aid of arc-plasma depositing of tungsten powder on molybdenum wafer.
引用
收藏
页码：187 / 191
页数：5
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