Laser-assisted synthesis of amorphous/pseudoamorphous GaN thin films and nanostructures

被引:0
|
作者
Shim, Seung Hwan [1 ]
Koshizaki, Naoto
Yoon, Jong-Won
Shim, Kwang Bo
机构
[1] Hanyang Univ, Dept Ceram Engn, CPRC, Seoul 133791, South Korea
[2] Natl Inst Adv Ind Sci & Technol, NARC, Ibaraki 3058565, Japan
来源
关键词
pulsed-laser ablation; GaN; amorphous; thin film; nanostructure;
D O I
10.4028/www.scientific.net/KEM.317-318.585
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Amorphous/pseudoarnorphous GaN was prepared by pulsed-laser ablation at room temperature without any heat treatment. The structure and chemical composition of the specimens were systematically investigated. Laser ablation at low Ar pressure (< 50Pa) led to deposition of smooth Ga-rich films, which is independent with laser energy. Under same pressures, as laser energy increased, the film stoichiometry changed from Ga-rich to near stoichiometric composition. Varying background Ar pressure strongly affected the product structure showing little effect on the chemical composition. Under higher pressure than 100 Pa, fine nanoparticles with a size of 5 nm rather than films were deposited on substrate due to the increased collision by plume confining. The optical band-gap of the deposited a-GaN is 2.8 eV for thin films and 3.9 eV for nanoparticles.
引用
收藏
页码:585 / 588
页数:4
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