Band gap engineering for graphene by using Na+ ions

被引:9
|
作者
Sung, S. J. [1 ]
Lee, P. R. [1 ]
Kim, J. G. [1 ]
Ryu, M. T. [1 ]
Park, H. M. [1 ]
Chung, J. W. [1 ]
机构
[1] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea
基金
新加坡国家研究基金会;
关键词
EPITAXIAL GRAPHENE; CARBON NANOTUBES; TRANSISTORS; INTERCALATION; NANORIBBONS; ADSORPTION; MONOLAYER; WAFER;
D O I
10.1063/1.4893993
中图分类号
O59 [应用物理学];
学科分类号
摘要
Despite the noble electronic properties of graphene, its industrial application has been hindered mainly by the absence of a stable means of producing a band gap at the Dirac point (DP). We report a new route to open a band gap (E-g) at DP in a controlled way by depositing positively charged Na+ ions on single layer graphene formed on 6H-SiC(0001) surface. The doping of low energy Na+ ions is found to deplete the pi* band of graphene above the DP, and simultaneously shift the DP downward away from Fermi energy indicating the opening of E-g. The band gap increases with increasing Na+ coverage with a maximum E-g >= 0: 70 eV. Our core-level data, C 1s, Na 2p, and Si 2p, consistently suggest that Na+ ions do not intercalate through graphene, but produce a significant charge asymmetry among the carbon atoms of graphene to cause the opening of a band gap. We thus provide a reliable way of producing and tuning the band gap of graphene by using Na+ ions, which may play a vital role in utilizing graphene in future nano-electronic devices. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:5
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