Systems in applications ranging from aerospace, automotive, to power distribution are all crucially comprised of electrical connectors. Every system with removable electrical components will have electrical connectors, and likewise these systems will be susceptible to the contact losses and failure modes of these connections. Corrosion is one of the largest causes of failure for electrical connectors and costs the electrical power distribution system in the United States hundreds of millions of dollars annually. This study demonstrates the viability graphene as a protective coating for copper connectors to mitigate corrosion and improve electrical contact performance. Graphene, which is constituted of single layers of hexagonally-oriented carbon atoms, is inherently ultra-thin, chemically and thermally stable, gas impermeable (a property which can inhibit corrosion), highly electrically conductive, and made from an abundant and low-cost components, making it an ideal candidate for implementation as a protective coating on electrical contacts. In this work, single-layer graphene was deposited on copper used in commercially-available electrical connectors. In static tests the electrical contact resistance of the graphene-coated copper contact was two orders of magnitude lower than the contact resistance of the bare copper, and performed similarly to a benchmark gold/nickel coating that is a widely-used anti-corrosive coating, demonstrating graphene's protective utility.
机构:
Univ Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
Univ Coimbra, Ctr Mech Engn Mat & Proc, CEMMPRE, Rua Luis Reis St, P-3030788 Coimbra, PortugalUniv Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
Nadeem, Irfan
Malok, Matjaz
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Jozef Stefan Inst, Solid State Phys Dept, Jamova Cesta 39, Ljubljana 1000, SloveniaUniv Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
Malok, Matjaz
Kovac, Janez
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Jozef Stefan Inst, Dept Surface Engn & Optoelect, Ljubljana 1000, SloveniaUniv Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
Kovac, Janez
Yaqub, Talha Bin
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Univ Coimbra, Ctr Mech Engn Mat & Proc, CEMMPRE, Rua Luis Reis St, P-3030788 Coimbra, Portugal
IPN, LED & MAT Inst Pedro Nunes, Lab Tests Wear & Mat, Rua Pedro Nunes, P-3030199 Coimbra, PortugalUniv Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
Yaqub, Talha Bin
Cavaleiro, Albano
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机构:
Univ Coimbra, Ctr Mech Engn Mat & Proc, CEMMPRE, Rua Luis Reis St, P-3030788 Coimbra, Portugal
IPN, LED & MAT Inst Pedro Nunes, Lab Tests Wear & Mat, Rua Pedro Nunes, P-3030199 Coimbra, PortugalUniv Ljubljana, Fac Mech Engn, Lab Tribol & Interface Nanotechnol TINT, Bogisiceva 8, Ljubljana 1000, Slovenia
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Northwestern Univ, Dept Chem, Evanston, IL 60208 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
Achtyl, Jennifer L.
Vlassiouk, Ivan V.
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Oak Ridge Natl Lab, Measurement Sci & Syst Engn Div, Oak Ridge, TN 37931 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
Vlassiouk, Ivan V.
Fulvio, Pasquale F.
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Oak Ridge Natl Lab, Div Chem Sci, Oak Ridge, TN 37831 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
Fulvio, Pasquale F.
Mahurin, Shannon M.
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Oak Ridge Natl Lab, Div Chem Sci, Oak Ridge, TN 37831 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
Mahurin, Shannon M.
Dai, Sheng
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Oak Ridge Natl Lab, Div Chem Sci, Oak Ridge, TN 37831 USA
Univ Tennessee, Dept Chem, Knoxville, TN 37996 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
Dai, Sheng
Geiger, Franz M.
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Northwestern Univ, Dept Chem, Evanston, IL 60208 USANorthwestern Univ, Dept Chem, Evanston, IL 60208 USA
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Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R ChinaShanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
Zhang, X. C.
Xu, B. S.
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机构:Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
Xu, B. S.
Wang, H. D.
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机构:Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
Wang, H. D.
Wu, Y. X.
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机构:Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
Wu, Y. X.
Jiang, Y.
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机构:Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
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Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
van der Zande, Arend M.
Barton, Robert A.
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Barton, Robert A.
Alden, Jonathan S.
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Alden, Jonathan S.
Ruiz-Vargas, Carlos S.
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Ruiz-Vargas, Carlos S.
Whitney, William S.
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Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Whitney, William S.
Pham, Phi H. Q.
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Univ Colorado, Dept Phys, Boulder, CO 80309 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Pham, Phi H. Q.
Park, Jiwoong
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机构:
Cornell Univ, Dept Chem, Ithaca, NY 14853 USA
Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Park, Jiwoong
Parpia, Jeevak M.
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Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Parpia, Jeevak M.
Craighead, Harold G.
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Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Craighead, Harold G.
McEuen, Paul L.
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Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
Kavli Inst Cornell Nanoscale Sci, Ithaca, NY 14853 USACornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA