High temperature outgassing tests on materials used in the DIII-D tokamak

被引:2
|
作者
Holtrop, K. L. [1 ]
Hansink, M. J. [1 ]
机构
[1] Gen Atom Co, San Diego, CA 92186 USA
来源
关键词
Tokamak devices;
D O I
10.1116/1.2178363
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This article is a continuation of previous work on determining the outgassing characteristics of materials used in the DIII-D magnetic fusion tokamak [K. L. Holtrop, J. Vac. Sci. Technol. A 17, 2064 (1999)]. Achievement of high performance plasma discharges in the DIII-D tokamak requires careful control of impurity levels. Among the techniques used to control impurities are routine bakes of the vacuum vessel to an average temperature of 350 degrees C. Materials used in DIII-D must release only very small amounts of impurities (below 2 X 10(-6) mole) at this temperature that could be transferred to the first wall materials and later contaminate plasma discharges. To better study the behavior of materials proposed for use in DIII-D at elevated temperatures, the initial outgassing test chamber was improved to include an independent heating control of the sample-and a simple load lock chamber. The goal was to determine not only the total degassing rate of the material during baking, but to also determine the gas species composition and to obtain a quantitative estimate of the degassing rate of each species by the use of a residual gas analyzer. Initial results for aluminum anodized using three different processes, stainless steel plated with black oxide and black chrome, and a commercially available fiber optic feedthrough will be presented. (c) 2006 American Vacuum Society.
引用
收藏
页码:1572 / 1577
页数:6
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