UV laser conditioning for reduction of 351-nm damage initiation in fused silica

被引：29

作者：

Brusasco, RM ^{[1
]}

Penetrante, BM ^{[1
]}

Peterson, JE ^{[1
]}

Maricle, SM ^{[1
]}

Menapace, JA ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2001 PROCEEDINGS | 2002年 / 4679卷

关键词：

UV laser surface damage; laser conditioning; damage initiation; fused silica;

D O I：

10.1117/12.461718

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper describes the effect of 355-nm laser conditioning on the concentration of UV-laser-induced surface damage sites on large-aperture fused silica optics. We will show the effect of various 355-nm laser conditioning methodologies on the reduction of surface-damage initiation in fused silica samples that have varying qualities of polishing. With the best, generally available fused silica optic, we have demonstrated that 355-nrn laser conditioning can achieve up to 10x reduction in surface damage initiation concentration in the fluence range of 10-14 J/cm(2) (355-nm @ 3 ns).

引用

页码：48 / 55

页数：8

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