Influence of strain on dislocation core in silicon

被引:2
|
作者
Pizzagalli, L. [1 ]
Godet, J. [1 ]
Brochard, S. [1 ]
机构
[1] Univ Poitiers, CNRS, Dept Phys & Mech Mat, Pprime Inst,UPR 3346, Chasseneuil, France
关键词
Dislocations; silicon; strain; density functional theory; tight binding; interatomic potential; TO-DUCTILE TRANSITION; IN-SITU DEFORMATION; LOW-TEMPERATURE; SHUFFLE; STRESS; SEMICONDUCTORS; MECHANISMS; PLASTICITY; MOTION; GLIDE;
D O I
10.1080/14786435.2018.1431412
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
First principles, density functional-based tight binding and semi-empirical interatomic potentials calculations are performed to analyse the influence of large strains on the structure and stability of a 60 degrees dislocation in silicon. Such strains typically arise during the mechanical testing of nanostructures like nanopillars or nanoparticles. We focus on bi-axial strains in the plane normal to the dislocation line. Our calculations surprisingly reveal that the dislocation core structure largely depends on the applied strain, for strain levels of about 5%. In the particular case of bi-axial compression, the transformation of the dislocation to a locally disordered configuration occurs for similar strain magnitudes. The formation of an opening, however, requires larger strains, of about 7.5%. Furthermore, our results suggest that electronic structure methods should be favoured to model dislocation cores in case of large strains whenever possible.
引用
收藏
页码:1151 / 1169
页数:19
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