A sub-nanosecond rise time intense electron beam source

被引：4

作者：

Kumar, R. ^{[1
]}

Chandra, R. ^{[1
]}

Mitra, S. ^{[1
]}

Beg, M. D. ^{[1
]}

Sharma, D. K. ^{[1
]}

Sharma, A. ^{[1
]}

Mittal, K. C. ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Accelerator & Pulse Power Div, Bombay 400085, Maharashtra, India

来源：

JOURNAL OF INSTRUMENTATION | 2014年 / 9卷

关键词：

Ion sources (positive ions; negative ions; electron cyclotron resonance (ECR); electron beam (EBIS)); Accelerator modelling and simulations (multi-particle dynamics; single-particle dynamics); Accelerator Subsystems and Technologies; Accelerator Applications;

D O I：

10.1088/1748-0221/9/04/P04017

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This paper presents the design and development of a 75 kV, 55 A, 2 nanosecond duration, <= 850 ps rise time, single shot, intense (> 100 A/cm(2)) electron beam source and also the measurement technique adopted in sub-nanosecond regime. A 200 kV (nanosecond pulse) coaxial pulse forming line (PFL) based pulser is designed to drive a cold cathode explosive emission electron gun. The electron gun diode consists with a planer graphite cathode, which has the emission area of 8mm diameter and a SS 304L anode mesh. Vacuum is achieved of the order of 3.5e-5 mbar by using a diffusion pump, backed by rotary pump. At the diagnostic side for diode voltage measurement a fast response copper sulphate aqueous solution resistive voltage divider is designed and implemented. For the beam current diagnostic a graphite Faraday cup is designed with taking care of response time in GHz (1.0-3.0 GHz) regime. The circuit diagram, voltage and current waveforms and the experimental setup is presented.

引用

页数：8

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