Corrosion resistance analysis of aluminium-doped zinc oxide layers deposited by pulsed magnetron sputtering

被引：5
|
作者：
G-Berasategui, E. [1 ]
Bayon, R. [1 ]
Zubizarreta, C. [1 ]
Barriga, J. [1 ]
Barros, R. [2 ,3 ]
Martins, R. [2 ,3 ]
Fortunato, E. [2 ,3 ]
机构：
[1] IK4 Tekniker, Res Ctr, Eibar 20600, Guipuzcoa, Spain
[2] Univ Nova Lisboa, FCT, Dept Ciencia Mat, CENIMAT I3N, P-2829516 Caparica, Portugal
[3] Univ Nova Lisboa, CEMOP UNINOVA, P-2829516 Caparica, Portugal
来源：
THIN SOLID FILMS | 2015年 / 594卷
关键词：
Aluminum-doped zinc oxide; Thin films; Transparent conductive films; Direct-current magnetron sputtering; Electrochemical impedance spectroscopy; Corrosion properties; ZNO FILMS;
D O I：
10.1016/j.tsf.2015.07.010
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this paper an exhaustive analysis is performed on the electrochemical corrosion resistance of Al-doped ZnO (AZO) layers deposited on silicon wafers by a DC pulsed magnetron sputtering deposition technique to test layer durability. Pulse frequency of the sputtering source was varied and a detailed study of the electrochemical corrosion response of samples in the presence of a corrosive chloride media (NaCl 0.06 M) was carried out. Electrochemical impedance spectroscopy measurements were performed after reaching a stable value of the open circuit at 2 h, 192 h and 480 h intervals. Correlation of the corrosion resistance properties with the morphology, and the optical and electrical properties was tested. AZO layers with transmission values higher than 84% and resistivity of 6.54 x 10(-4) Omega cm for a deposition process pressure of 3 x 10(-1) Pa, a sputtering power of 2 kW, a pulse frequency of 100 kHz, with optimum corrosion resistance properties, were obtained. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：256 / 260
页数：5
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