Reconstruction determined submonolayer growth of Ag on Si(111)-(7x7) surface

被引:9
|
作者
Sobotík, P [1 ]
Ost'ádal, I [1 ]
Kocán, P [1 ]
机构
[1] Charles Univ Prague, Fac Math & Phys, Dept Elect & Vacuum Phys, Prague 18000 8, Czech Republic
关键词
epitaxy; growth; surface structure; morphology; roughness; and topography; silver; silicon; metal-semiconductor interfaces;
D O I
10.1016/S0039-6028(02)01275-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The submonolayer growth of Ag on Si(1 1 1)-(7 x 7) surface at temperatures from 420 to 540 K was studied. Island densities, size distributions and average number of Ag atoms per occupied half-unit cell (HUC) of 7 x 7 reconstruction were investigated. At higher coverage large 2D islands with jagged shapes were observed. A scenario of the growth was outlined, based on the assumptions of existence of saturated Ag islands on the surface which cannot overgrow HUC boundaries by adatom capture. Such a model explains morphology of the large islands as well as the presence of the large amount of small islands formed inside HUCs. The capacity of a single HUC was found to be approximate to18 Ag atoms and the capacity of HUCs covered by the large islands was found to be approximate to31 Ag atoms on average. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:389 / 393
页数:5
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