The effect of nitrogen ion implantation on wear behaviour of single-crystal SiO2

被引：5
|
作者：
Xu, T [1 ]
Lu, JJ [1 ]
Tian, J [1 ]
Xue, QJ [1 ]
机构：
[1] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2000年 / 33卷 / 04期
关键词：
D O I：
10.1088/0022-3727/33/4/316
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect of nitrogen ion implantation on the wear behaviour and the change of structure of single-crystal SiO2 was investigated by SEM, TEM and XPS. The results show that the tribological properties of single-crystal SiO2 under dry friction conditions change with the nitrogen ion implantation. At low implanted doses, the hardness and critical peeling load for single-crystal SiO2 varies inconspicuously and the tribological properties an also not improved. However, the wear resistance is greatly improved at doses of 5 x 10(16) and 1 x 10(17) N cm(-2). When the dose reaches 5 x 10(17) N cm(-2), the tribological properties of single-crystal SiO2 decrease again. The possible friction and wear mechanisms for single-crystal SiO2 were discussed.
引用
收藏
页码：426 / 429
页数：4
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