Nanostructured substrate effects on diamond-like Carbon films properties grown by pulsed laser deposition

被引:10
|
作者
Hevia, S. A. [1 ,2 ]
Guzman-Olivos, F. [3 ]
Munoz, I. [1 ]
Munoz-Cordovez, G. [1 ]
Caballero-Bendixsen, S. [1 ]
Ruiz, H. M. [4 ]
Favre, M. [1 ]
机构
[1] Pontificia Univ Catolica Chile, Inst Fis, Av Vicuna Mackenna 4860, Santiago, Chile
[2] Ctr Invest Nanotecnol & Mat Avanzados CIEN UC, Av Vicuna Mackenna 4860, Santiago, Chile
[3] Univ Chile, Fac Ciencias Fis & Matemat, Dept Fis, Av Blanco Encalada 2008, Santiago, Chile
[4] Univ Tecn Federico Santa Maria, Dept Fis, Av Espana 1680, Valparaiso, Chile
来源
关键词
DLC; PLD; Nanostructured substrate; Carbon nanodots; AFM; Raman; ELECTRON FIELD-EMISSION; MOLECULAR-DYNAMICS; COMPRESSIVE STRESS; THIN-FILMS; SUBPLANTATION; MODEL;
D O I
10.1016/j.surfcoat.2016.08.083
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A study on the effect of using a nanostructured substrate in the growth of a diamond-like carbon (DLC) film by pulsed laser deposition (PLD) has been carried out. It was found that the deposition on a nanoporous substrate gives origin to a film with a lower ratio of the sp(3) to sp(2) hybridizations of carbon atoms bondings as compared to a film deposited on a flat substrate under the same conditions, namely flat Silicon (Si) or Aluminum (Al) foil. This could be a consequence of a local stress relaxation during the growing process induced by the nanoporous structure of the substrate, suggesting that it might not be possible to obtain a high content of tetrahedral amorphous carbon when that kind of substrates is used. Motivated by previous investigations of nanodots growth using a nanoporous alumina substrate, a low pressure Argon background was used during the deposition process, in order to achieve different values of the sp(3) content. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:55 / 60
页数:6
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