Supercoupling effect in short-channel ultrathin fully depleted silicon-on-insulator transistors

被引:23
|
作者
Navarro, C. [1 ,2 ]
Bawedin, M. [2 ]
Andrieu, F. [3 ]
Sagnes, B. [1 ]
Martinez, F. [1 ]
Cristoloveanu, S. [2 ]
机构
[1] Univ Montpellier, Inst Elect & Syst, F-34095 Montpellier 5, France
[2] Grenoble INP, MINATEC, IMEP LAHC, F-38016 Grenoble 1, France
[3] MINATEC, CEA LETI, F-38054 Grenoble 1, France
关键词
THRESHOLD VOLTAGE; SOI; INVERSION; MOSFETS; MODEL;
D O I
10.1063/1.4935453
中图分类号
O59 [应用物理学];
学科分类号
摘要
Supercoupling effect prevents the simultaneous formation of inversion and accumulation channels at the two interfaces of ultrathin silicon-on-insulator metal-oxide-semiconductor field-effect transistor. Our work highlights that short-channel effects enhance supercoupling and turn it into a two-dimensional mechanism. The lateral influence of source and drain terminals is evidenced with experimental data and examined by 2D numerical simulations which reveal the roles of gate length and drain bias. The critical Si-film thickness, below which supercoupling arises, is significantly increased in short-channel transistors. The impact of back-gate and drain bias, BOX thickness, and quantum effects is documented and practical applications are discussed. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:7
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