Writing waveguides in glass with a femtosecond laser

被引:2341
|
作者
Davis, KM
Miura, K
Sugimoto, N
Hirao, K
机构
[1] Hirao Active Glass Project, Exploratory Res. for Adv. Technology, Res. Devmt. Corporation of Japan, Shimogamo, Sakyo-Ku, Kyoto G06
关键词
D O I
10.1364/OL.21.001729
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
With the goal of being able to create optical devices for the telecommunications industry, we investigated the effects of 810-nm, femtosecond laser radiation on various glasses. By focusing the laser beam through a microscope objective, we successfully wrote transparent, but visible, round-elliptical damage lines inside high-silica, berate, soda lime silicate, and fluorozirconate (ZBLAN) bulk glasses. Microellipsometer measurements of the damaged region in the pure and Ge-doped silica glasses showed a 0.01-0.035 refractive-index increase, depending on the radiation dose. The formation of several defects, including Si E' or Ge E' centers, nonbridging oxygen hole centers, and peroxy radicals, was also detected. These results suggest that multiphoton interactions occur in the glasses and that it may be possible to write three-dimensional optical circuits in bulk glasses with such a focused laser beam technique. (C) 1996 Optical Society of America
引用
收藏
页码:1729 / 1731
页数:3
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