Band bending and adsorption/desorption kinetics on N-polar GaN surfaces

被引:11
|
作者
Choi, Soojeong [1 ]
Kim, Tong-Ho [1 ]
Wu, Pae [1 ]
Brown, April [1 ]
Everitt, Henry O. [1 ,2 ]
Losurdo, Maria [3 ]
Bruno, Giovanni [3 ]
机构
[1] Duke Univ, Dept Elect & Comp Engn, Durham, NC 27708 USA
[2] Duke Univ, Dept Phys, Durham, NC 27708 USA
[3] CNR, Inst Inorgan Methodol & Plasmas, I-70126 Bari, Italy
来源
关键词
MOLECULAR-BEAM EPITAXY;
D O I
10.1116/1.3054345
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Highly reactive N-polar [000-1] GaN surfaces were analyzed using spectroscopic ellipsometry. Following exposure to air, observed changes in the pseudodielectric function near the GaN band edge indicate that surface contamination reduces the band bending. A subsequent Ga adsorption/desorption experiment on pristine N-polar GaN indicates that it contains a mixture of Ga-terminated and N-terminated surfaces. During deposition, Ga adatoms preferentially bond to the dangling bonds on the N-terminated surface: the measured 3.19 eV desorption activation energy equals the Ga-N decomposition energy. Further deposition forms a 1 ML Ga wetting layer whose 2.78 eV desorption activation energy is comparable to the Ga sublimation energy. (C) 2009 American Vacuum Society. [DOI: 10.1116/1.3054345]
引用
收藏
页码:107 / 112
页数:6
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