共 50 条
- [2] PRESENT AND FUTURE-TRENDS IN MICROLITHOGRAPHY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (12B): : 4103 - 4109
- [4] Present and future trends in excimer laser based microlithography [J]. ATOMIC AND MOLECULAR PULSED LASERS II, 1998, 3403 : 248 - 253
- [5] THE TECHNOLOGICAL NEEDS OF THE FUTURE INTEGRATED-CIRCUITS - THEIR IMPACT ON MICROLITHOGRAPHY [J]. ANNALES DE CHIMIE-SCIENCE DES MATERIAUX, 1986, 11 (08): : 731 - 741
- [6] Marching of the microlithography horses: Electron, ion, and photon: Past, present, and future [J]. OPTICAL MICROLITHOGRAPHY XX, PTS 1-3, 2007, 6520
- [8] Microlithography and aviation [J]. JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2006, 5 (04):
- [9] Critical dimension photomask metrology tool requirements for 0.25 um and future microlithography [J]. 16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1996, 2884 : 208 - 218