Crack Propagation in Nonalkaline Glass Activated by Laser-Crystallized Polycrystalline Silicon Films

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作者
Hara, Akito [1 ]
Goto, Keisuke [1 ]
Kitahara, Kuninori [2 ]
机构
[1] Tohoku Gakuin Univ, Tagajo, Miyagi 9858537, Japan
[2] Shimane Univ, Matsue, Shimane 6908504, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We investigated the effect of polycrystalline silicon (poly-Si) films on the mechanical properties of nonalkaline glass (NAG) with regards to crack propagation 150-nm-thick poly-Si films formed by continuous-wave laser lateral crystallization (CLC) were used as the poly-Si film and indentations intentionally introduced by harness tester were used as source of crack. The cracks propagated only along the laser scan direction, and crack propagation was surprisingly observed at room temperature. Moreover, crack propagation was suppressed after thinning of CLC poly-Si film by wet etching, indicating that the driving force for crack propagation is elastic in nature
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页码:265 / +
页数:2
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