0.8-V Supply Voltage Deep-Submicrometer Inversion-Mode In0.75Ga0.25As MOSFET

被引:72
|
作者
Wu, Y. Q. [1 ,2 ]
Wang, W. K. [3 ]
Koybasi, O. [1 ,2 ]
Zakharov, D. N. [1 ,2 ]
Stach, E. A. [1 ,2 ]
Nakahara, S. [3 ]
Hwang, J. C. M. [3 ]
Ye, P. D. [1 ,2 ]
机构
[1] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
[2] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
[3] Lehigh Univ, Dept Elect & Comp Engn, Bethlehem, PA 18105 USA
基金
美国国家科学基金会;
关键词
Atomic layer deposition; high-k; InGaAs; MOSFET; HIGH-PERFORMANCE; INGAAS MOSFET; GATE STACK; ENHANCEMENT; CHANNEL; TRANSISTOR; MOBILITY; HFALO;
D O I
10.1109/LED.2009.2022346
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the experimental demonstration of deep-submicrometer inversion-mode In0.75Ga0.25As MOSFETs with ALD high-k Al2O3 as gate dielectric. In this letter, n-channel MOSFETs with 100-200-nm-long gates have been fabricated. At a supply voltage of 0.8 V, the fabricated devices with 200-130-nm-long gates exhibit drain currents of 232-440 mu A/mu m and transconductances of 538-705 mu S/mu m. The 100-nm device has a drain current of 801 mu A/mu m and a transconductance of 940 mu S/mu m. However, the device cannot be pinched off due to severe short-channel effect. Important scaling metrics, such as on/off current ratio, subthreshold swing, and drain-induced barrier lowering, are presented, and their relations to the short-channel effect are discussed.
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页码:700 / 702
页数:3
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