Investigation of the effects of MoO3 buffer layer on charge carrier injection and extraction by capacitance-voltage measurement

被引:1
|
作者
Gong, Wei [1 ,2 ]
Xu, Zheng [1 ,2 ]
Zhao, Suling [1 ,2 ]
Liu, Xiaodong [1 ,2 ]
Fan, Xing [1 ,2 ]
Yang, Qianqian [1 ,2 ]
Kong, Chao [1 ,2 ]
机构
[1] Beijing Jiaotong Univ, Key Lab Luminescence & Opt Informat, Minist Educ, Beijing 100044, Peoples R China
[2] Beijing Jiaotong Univ, Inst Optoelect Technol, Beijing 100044, Peoples R China
来源
CHINESE SCIENCE BULLETIN | 2014年 / 59卷 / 08期
基金
中国国家自然科学基金;
关键词
Capacitance-voltage measurement; Buffer layer; Charge carrier injection; Charge carrier collection; Solar cells; OPEN-CIRCUIT VOLTAGE; SOLAR-CELLS; ELECTRON INJECTION; V CURVES; EFFICIENCY; CATHODE; SPECTROSCOPY; ENHANCEMENT; MOBILITY; SHAPE;
D O I
10.1007/s11434-013-0112-6
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The effects of MoO3 thin buffer layer on charge carrier injection and extraction in inverted configuration ITO/ZnO/MEH-PPV (poly(2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene))/MoO3 (0, 5 nm)/Ag hybrid solar cells are investigated by capacitance-voltage measurement under dark and light illumination conditions. The efficiency of charge carrier injection and extraction is enhanced by inserting 5 nm MoO3 thin layer, resulting in better device performances. Charge carrier transport of the whole device is improved and the interface energy barrier is reduced by inserting 5 nm MoO3 thin buffer layer. The device fill factor is increased from 54.1 % to 57.5 % after modifying 5 nm MoO3. Simulations and experimental results consistently show that in the forward voltage under dark, the device with the 5 nm MoO3 thin layer modification generates larger value of capacitance than the device without MoO3 layer. While under illumination, the device with the 5 nm MoO3 layer generates smaller value of capacitance than the device without the 5 nm MoO3 layer in the bias region of reverse and before the peak position of maximum capacitance (V (Cmax)). The underlying mechanism of the MoO3 anode buffer layer on device current density-voltage characteristics is discussed.
引用
收藏
页码:747 / 753
页数:7
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