Chemically deposited nano grain composed MoS2 thin films for supercapacitor application

被引:84
|
作者
Pujari, R. B. [1 ]
Lokhande, A. C. [2 ]
Shelke, A. R. [1 ]
Kim, J. H. [2 ]
Lokhande, C. D. [3 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India
[2] Chonnam Natl Univ, Dept Mat Sci & Engn, Gwangju 500757, South Korea
[3] DY Patil Univ, Ctr Interdisciplinary Res, Kolhapur 416006, Maharashtra, India
基金
新加坡国家研究基金会;
关键词
Chemical synthesis; Galvanostatic charge-discharge; Gravimetric energy density; MoS2; Supercapacitor; Thin film; HIGH-PERFORMANCE SUPERCAPACITORS; ENHANCED ELECTROCHEMICAL PROPERTIES; FLEXIBLE SUPERCAPACITORS; HYDROGEN EVOLUTION; ELECTRODE MATERIAL; NANOSHEETS; NANOCOMPOSITES; NANOSPHERES; NANOFLAKES; MONOLAYER;
D O I
10.1016/j.jcis.2016.11.026
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Low temperature soft chemical synthesis approach is employed towards MoS2 thin film preparation on cost effective stainless steel substrate. 3-D semispherical nano-grain composed surface texture of MoS2 film is observed through FE-SEM technique. Electrochemical supercapacitor performance of MoS2 film is tested from cyclic voltammetry (CV) and galvanostatic charge discharge (GCD) techniques in 1 M aqueous Na2SO4 electrolyte. Specific capacitance (C-s) of 180 Fg(-1) with CV cycling Stability of 82 % for 1000 cycles is achieved. Equivalent series resistance (R-s) of 1.78 Omega cm(-2) observed through Nyquist plot shows usefulness of MoS2 thin film for charge conduction in supercapacitor application. (C) 2016 Published by Elsevier Inc.
引用
收藏
页码:1 / 7
页数:7
相关论文
共 50 条
  • [1] Properties of chemically-deposited nanocrystalline MoS2 thin films
    D. J. Sathe
    P. A. Chate
    S. B. Sargar
    S. V. Kite
    Z. D. Sande
    [J]. Journal of Materials Science: Materials in Electronics, 2016, 27 : 3834 - 3838
  • [2] Properties of chemically-deposited nanocrystalline MoS2 thin films
    Sathe, D. J.
    Chate, P. A.
    Sargar, S. B.
    Kite, S. V.
    Sande, Z. D.
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (04) : 3834 - 3838
  • [3] Chemically deposited nanocrystalline NiO thin films for supercapacitor application
    Patil, U. M.
    Salunkhe, R. R.
    Gurav, K. V.
    Lokhande, C. D.
    [J]. APPLIED SURFACE SCIENCE, 2008, 255 (05) : 2603 - 2607
  • [4] Enhanced photoresponse and high photo-detectivity in chemically deposited MoS2 thin films with inherent strain
    Dam, Siddhartha
    Thakur, Abhishek
    Hussain, Shamima
    [J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2021, 136
  • [5] MoS2/CoS2 composites composed of CoS2 octahedrons and MoS2 nano-flowers for supercapacitor electrode materials
    Haiyan Li
    Yucheng Zhao
    Chang-An Wang
    [J]. Frontiers of Materials Science, 2018, 12 : 354 - 360
  • [6] MoS2/CoS2 composites composed of CoS2 octahedrons and MoS2 nano-flowers for supercapacitor electrode materials
    Li, Haiyan
    Zhao, Yucheng
    Wang, Chang-An
    [J]. FRONTIERS OF MATERIALS SCIENCE, 2018, 12 (04) : 354 - 360
  • [7] Thermal anisotropy in nano-crystalline MoS2 thin films
    Muratore, Chris
    Varshney, Vikas
    Gengler, Jamie J.
    Hu, Jianjun
    Bultman, John E.
    Roy, Ajit K.
    Farmer, Barry L.
    Voevodin, Andrey A.
    [J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2014, 16 (03) : 1008 - 1014
  • [8] MoS2 thin films deposited by R.F magnetron sputtering
    Kim, SK
    Ahn, YH
    [J]. KORUS 2000: 4TH KOREA-RUSSIA INTERNATIONAL SYMPOSIUM ON SCIENCE AND TECHNOLOGY, PT 3, PROCEEDINGS: MACHINE PARTS AND MATERIALS PROCESSING, 2000, : 362 - 368
  • [9] Growth, structure and stability of sputter-deposited MoS2 thin films
    Kaindl, Reinhard
    Bayer, Bernhard C.
    Resel, Roland
    Mueller, Thomas
    Skakalova, Viera
    Habler, Gerlinde
    Abart, Rainer
    Cherevan, Alexey S.
    Eder, Dominik
    Blatter, Maxime
    Fischer, Fabian
    Meyer, Jannik C.
    Polyushkin, Dmitry K.
    Waldhauser, Wolfgang
    [J]. BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2017, 8 : 1115 - 1126
  • [10] MoS2 thin films spectrophotometry
    Belikov, A. I.
    Phyo, Kyaw Zin
    [J]. 25TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY, 2018, 387