Structural and electrical characterization of heteroepitaxial Pb[Yb1/2Nb1/2]O3-PbTiO3 thin films

被引:18
|
作者
Bornand, V [1 ]
Trolier-McKinstry, S [1 ]
机构
[1] Penn State Univ, Dept Mat Sci & Engn, Mat Res Lab, University Pk, PA 16802 USA
关键词
D O I
10.1063/1.372441
中图分类号
O59 [应用物理学];
学科分类号
摘要
The pulsed laser deposition process has been used to prepare heteroepitaxial (1-x) Pb[Yb1/2Nb1/2]O-3-xPbTiO(3) (PYbN-PT, x=0.4,0.5) thin films on single crystalline (001)(pc)SrRuO3/LaAlO3 and (111)(pc)SrRuO3/SrTiO3 substrates (the subscript pc refers here to the pseudocubic subcell). High laser frequencies (f-16 Hz) and 300 mTorr of background O-3/O-2 in the chamber during deposition provide stoichiometric and high crystalline quality heterostructures. Temperatures in the 560-660 degrees C range lead to improved microstructures as well as good dielectric and ferroelectric properties consistent with those of PYbN-PT ceramics. In particular, films show room temperature dielectric constants greater than 1300 and exhibit well-developed hysteresis loops with remanent polarizations (P-r) as high as 40-50 mu C cm(-2). Results are discussed in terms of film composition and crystallinity. (C) 2000 American Institute of Physics. [S0021-8979(00)05708-X].
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页码:3958 / 3964
页数:7
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