Low-energy ion beam-assisted deposition of giant magnetoresistive thin films

Granular and multilayer Co-Ag and NiFe-Ag thin films have been prepared by magnetron sputtering and by concurrent low-energy (0-500 eV) ion radiation-assisted deposition. The ion beam bombardment slightly increased the giant magnetoresistance of granular films and then progressively decreased it. X-ray data revealed a change in the crystalline structure of these films, dependent on the energy of the beam. Examination using transmission electron microscopy (TEM) also highlighted differences between the as-sputtered and the ion beam-assisted films. For multilayer films, TEM and x-ray analysis shows changes in the interfacial and crystal structure induced by the ion beam. (C) 1996 American Institute of Physics.