Quick preparation of thin films and nanosize powders by high-density ablation plasma produced by intense pulsed ion beam

被引:0
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作者
Yatsui, K [1 ]
Jiang, W [1 ]
Suematsu, H [1 ]
Suzuki, T [1 ]
Kinemuchi, Y [1 ]
Yang, SC [1 ]
机构
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using high-density ablation plasma produced by the intense pulsed ion beam interaction with solid targets, we have successfully prepared various kinds of thin films or ultrafine nanosize powders by rapid cooling, which was named pulsed ion beam evaporation (IBE). Very quick and stoichiometric preparation is available by the ablation plasma (density similar to 10(19) cm(-3)) in vacuum, without heating substrate or without post-annealing. Since we have reported the preparation of thin films of ZnS in 1988 [1], we only discuss the preparation of crystallized B4C films, because we believe this is the first demonstration in the world. As known, B4C is very hard after diamond, wear resistant, and stable at high temperature. The experiment was done by an intense pulsed power machine, "ETIGO-II". Using various diagnostics by XRD, FT-IF, FE-SEM, TEM, EELS, and Vickers hardness, we have confirmed the preparation of the crystallized B4C films [2]. Absorptions associated with B-C bond have been clearly observed. The maximum Vickers harness was achieved to 2,300.
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页码:520 / 523
页数:4
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