Hard x-ray nanofocusing by multilayer Laue lenses

被引:92
|
作者
Yan, Hanfei [1 ]
Conley, Ray [1 ,2 ]
Bouet, Nathalie [1 ]
Chu, Yong S. [1 ]
机构
[1] Brookhaven Natl Lab, Natl Synchrotron Light Source 2, Upton, NY 11973 USA
[2] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
关键词
multilayer Laue lens; x-ray nanofocusing optics; thin-film deposition; dynamical diffraction; synchrotron instrumentation; x-ray microscopy; FRESNEL ZONE-PLATE; K-B MIRRORS; ESTIMATING ABERRATIONS; THIN-FILMS; RESOLUTION; STRESS; FIELD; BEAM; DIFFRACTION; RECONSTRUCTION;
D O I
10.1088/0022-3727/47/26/263001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Multilayer Laue lens (MLL) is a new class of x-ray optics that offer great promise for achieving nanometre-level spatial resolution by focusing hard x-rays. Fabricating an MLL via thin-film deposition provides the means to achieve a linear Fresnel-zone plate structure with zone widths below 1 nm, while retaining a virtually limitless aspect ratio. Despite its similarity to the Fresnel-zone plate, MLL exhibits categorically distinctive focusing properties and their fabrication comes with a wide array of challenges. This article provides a comprehensive review of advances in MLLs, and includes extensive theoretical modelling on focusing performance, discussion on fabrication challenges, their current capabilities and notable results from x-ray focusing experiments.
引用
收藏
页数:31
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