Shape memory behavior of TiNi alloy films sputter-deposited on polyimide substrate

被引:6
|
作者
Kishi, Yoichi [1 ]
Ikenaga, Noriaki [1 ]
Sakudo, Noriyuki [1 ]
Yajima, Zenjiro [1 ]
机构
[1] Kanazawa Inst Technol, Adv Mat Sci Res & Dev Ctr, Haku San, Ishikawa 9240838, Japan
关键词
Sputtering; Ion irradiation; Low temperature crystallization; Shape memory alloy film; Bimorph actuator; ION-IMPLANTATION; TEMPERATURE;
D O I
10.1016/j.jallcom.2012.02.020
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We developed an RF magnetron sputtering system equipped with separate sources as well as with a heating and ion-irradiating system for substrates. Without using the ion-irradiating system for substrates, the films deposited on ambient-temperature substrate have been amorphous. However, we find that crystallized film is deposited even at 353 K of substrate temperature with simultaneous ion irradiation. Shape memory effect of the crystallized film which was-deposited on a polyimide sheet of 0.025 mm in thickness was observed. The film deposited on a polyimide sheet was cut into the shape of a double-beam cantilever and the ends of the two beams were connected to an electrical power supply. The double-beam shows a two-way motion by turning on and off at room temperature. These results are expected to find use in extensive applications as a convenient small actuator. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:S210 / S214
页数:5
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