Influence of Electromagnetic-Field Nonuniformity on The Interaction Between a H-Wave and a Thin Metal Layer

被引:1
|
作者
Utkin, A., I [1 ]
Yushkanov, A. A. [2 ]
机构
[1] State Univ Humanities & Technol, Orekhovo Zuyevo 142611, Moscow Oblast, Russia
[2] Moscow State Reg Univ, Moscow 105005, Russia
来源
JOURNAL OF SURFACE INVESTIGATION | 2019年 / 13卷 / 02期
基金
俄罗斯基础研究基金会;
关键词
thin metal layer; electromagnetic H-wave; reflection coefficient; wave number; nonuniform electric field; ELECTRICAL-CONDUCTIVITY; OPTICAL-PROPERTIES; ABSORPTION; THICKNESS;
D O I
10.1134/S1027451019020186
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The interaction between an electromagnetic H-wave and a thin metal layer is calculated taking into account the different reflection coefficients q(1) and q(2) of its surfaces at different angles of wave incidence in the case where the electric field is uniform. The influence of the dependence of the layer's electrical conductivity on the electric-field nonuniformity on the characteristics of the fieldlayer interaction is taken into account. The behavior of the coefficients of reflection R, transmission T, and absorption A as functions of the external field frequency, the frequency of bulk collisions of electrons, and the wave incidence angle are analyzed.
引用
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页码:221 / 227
页数:7
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