The Technique of Ion Beam Etching Polishing

被引：2
|
作者：
Guo, ChengJun [1 ]
Pei, Ning [1 ]
Wang, DaSen [1 ]
Nie, FengMing [1 ]
Zhang, GuangPing [1 ]
Li, YuPeng [1 ]
机构：
[1] Northern Inst Mat Sci & Engn, Ningbo 315103, Zhejiang, Peoples R China
来源：
ADVANCED MATERIALS AND PROCESSES III, PTS 1 AND 2 | 2013年 / 395-396卷
关键词：
Ion beam; Etching; Polishing; OPTICS;
D O I：
10.4028/www.scientific.net/AMM.395-396.1066
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
The accelerated gas ions collide with the surface material, the atom or molecule on material surface is removed by momentum transferring. Depositing a layer low viscosity of the thin film materials on the original surface of the optical, such materials will form a layer thin film on the surface of optical element that is lower than the original. Remove the high-spatial frequencies and obtain super precision optical surface.
引用
收藏
页码：1066 / 1070
页数：5
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