Study on growth mechanisms and electronic structures of polar NiO(111) ultrathin films using iron oxide buffer layers

被引:7
|
作者
Xue, Mingshan [1 ,2 ]
Guo, Qinlin [2 ]
机构
[1] Nanchang Hangkong Univ, Sch Mat Sci & Engn, Nanchang 330063, Peoples R China
[2] Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China
关键词
NiO(111); Buffer layers; Polar materials; THIN-FILM; SURFACE; ALPHA-FE2O3; ADSORPTION; OXIDATION; MAGNETITE; SPECTRA; PT(111); STATES; FE3O4;
D O I
10.1016/j.jallcom.2014.02.023
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Polar surfaces of metal oxides have attracted considerable attention in fundamental science and technological applications because of their peculiar stabilization mechanisms and unusual adsorption and catalytic properties. In this study, various ordered iron oxide films, including FeO(111), Fe3O4(111) and Fe2O3(0001), were successfully used as the buffer layers for the growth of polar NiO(111) films with several nanometer thickness. The results indicated that the iron oxide buffer layers reduced the lattice mismatch between NiO(111) and Mo(110) substrate, and also decreased the interfacial energy by means of the interfacial reaction between NiO and iron oxide surfaces, benefiting the initial nucleation and the growth of polar NiO(111) films. This study will be essential for understanding the physical and chemical properties of polar surfaces. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:224 / 229
页数:6
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